发明名称 SEMICONDUCTOR DEVICE
摘要 PURPOSE:To improve a switching speed by a method wherein a voltage not so large as to saturate a whole domain of a channel is applied to the first gate electrode and a signal voltage which turns an MIS semiconductor element on and off is applied to the second gate electrode. CONSTITUTION:The first gate electrode 7 is formed on the source side of a channel and the second gate electrode 8 is so provided as to be larger than the electrode of a drain 6 of the channel. A voltage is always applied to the electrode 7. This voltage is applied in order to form a local channel 14 under the electrode 7 and its value is not so large as to saturate the whole channel. A signal voltage for turning an N-channel MOSFET on and off is applied to the electrode 8. A channel is formed or extinguished on the side of the drain 6 by the signal voltage applied to the electrode 8 and the MOSFET is turned on and off by that channel and the local channel 14.
申请公布号 JPS61214577(A) 申请公布日期 1986.09.24
申请号 JP19850054551 申请日期 1985.03.20
申请人 HITACHI LTD 发明人 MATSUBARA OSAMU
分类号 H01L29/78;H03K17/687 主分类号 H01L29/78
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