发明名称 CRUCIBLE FOR VAPOR DEPOSITION
摘要 PURPOSE:To obviate the generation of a spitting defect in a film deposited by evaporation on a substrate and to eliminate the difficulty in opening and closing of the cap of a crucible for vapor deposition to be used in a cluster ion beam vapor deposition method by constituting the above-mentioned crucible of a crucible body, packing and specifically constructed cap body. CONSTITUTION:The Mo packing 12 is placed to the top end of the crucible body 10 for vapor deposition which is made of Ta, C, etc. and is used in the stage of depositing ThF4, SrF2, CeF3, YF3 or MgF2, etc., on the substrate by the cluster ion beam vapor deposition method. A space 14 which does not contact with the cap 11 made of the same material as the body 10 and having a central nozzle 15 is provided in the upper part of the crucible and plural fine poles 16 are provided to the cap part 11 to communicate the space 14 and the external air. The crucible material has good wettability with the vapor deposition material and therefore the generation of spitting to the formed film is obviated and the sticking of the vapor deposition material to the crucible body is prevented by the screw part of the cap 11.
申请公布号 JPS61213371(A) 申请公布日期 1986.09.22
申请号 JP19850054854 申请日期 1985.03.19
申请人 SUMITOMO ELECTRIC IND LTD 发明人 IWAMOTO HIROMI;HIGUCHI FUMIAKI
分类号 C23C14/24;C30B23/08 主分类号 C23C14/24
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