| 摘要 |
PURPOSE:To form a deposited film having a uniform thickness on a substrate by disposing the substrate at the non-parallel space from a light beam in the stage of depositing the film of the resultant product of reaction formed by irradiating the light beam to an atmosphere gas and decomposing photochemically the gas on the substrate. CONSTITUTION:The substrate 3 is disposed non-parallel with the light beam 1 in such a manner that the substrate 3 is positioned rearer the beam 1 toward the advancing direction of the beam 1 in the stage of irradiating the light beam 1 to the reactive atmosphere gas from an incident window 2, decomposing photochemically the reactive gas and depositing the film of the resultant product of the decomposition on the surface of the substrate 3. The light beam 1 enters the chamber through the window 2 and the intensity thereof weakens and the amt. of the resultant product of photodecomposition reaction decreases as the beam travels forward. The resultant product is therefore deposited on the substrate in the narrow diffusion range and the film deposited by evaporation on the substrate 3 is formed to the uniform thickness over the entire surface thereof.
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