| 摘要 |
PURPOSE:To prevent burning and damage by forming a photomask made of a hard mask material contg. a transparent indium oxide film. CONSTITUTION:The conductive boundary film 4 contg. indium oxide is deposited as a layer to be brought into close contact with the whole surface of a transparent base plate 3 of a photomask by the vapor deposition or sputtering process, and a film conventionally used as a hard mask, such as Cr, Cr2O3, or Fe2O3, is formed on the film 4, thus permitting the surface of the base 3 to be prevented from burning almost perfectly by immediately depositing the transparent indium oxide film on the polished and washed base 3. |
