发明名称 |
Electron beam/optical hybrid lithographic resist process in acoustic wave devices |
摘要 |
A method is disclosed for using a combination of electron beam and photo lithography in making a acoustic wave device. The process is preformed by first using a positive photoresist and electron beam writing to designate the fine lines required in acoustic wave devices. Next, a second photoresist and optical lithography are used to delineate the pad areas.
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申请公布号 |
US4612274(A) |
申请公布日期 |
1986.09.16 |
申请号 |
US19850799366 |
申请日期 |
1985.11.18 |
申请人 |
MOTOROLA, INC. |
发明人 |
CHO, FREDERICK Y.;JOSEPH, JOHN R.;SEESE, PHILIP A. |
分类号 |
G03F7/20;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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