发明名称 |
PROCESS FOR PRODUCING COPOLYMER FILMS |
摘要 |
<p>A process for producing polyamide-polyimide block copolymer films or polyamide-polyimide copolymer films having excellent thermal resistance and mechanical strength, which comprises casting a solvent solution of a polyamide-polyamide acid block copolymer or a polyamide-polyamide acid copolymer on a substrate, converting the deposited thin layer of the solution into a self-supporting film, regulating the residual solvent content of the film by heating or other means, if necessary, and then heating the film at a temperature of 320.degree. to 500.degree.C for a specified period of time.</p> |
申请公布号 |
CA1211264(A) |
申请公布日期 |
1986.09.16 |
申请号 |
CA19840453744 |
申请日期 |
1984.05.07 |
申请人 |
MITSUI TOATSU CHEMICALS, INCORPORATED |
发明人 |
SATO, TAKUSHI;KAWAMATA, MOTOO;TAKAHASHI, SHIGERU;IBI, AKIRA;NAITO, MITUYUKI;SHINDO, KAZUMI;SHISHIDO, SHIGEYUKI |
分类号 |
B29C41/12;B29B7/00;B29C31/00;B29C47/00;B29C47/88;B29D7/01;B32B15/08;B32B15/088;C08G18/00;C08G18/34;C08G73/14;C08J3/09;C08J5/18;C08J7/00;H01B3/30;H05K1/03;(IPC1-7):B29C39/14 |
主分类号 |
B29C41/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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