| 摘要 |
PURPOSE:To enable positioning with minute resolution with a simple mechanism by adjusting a mutual interval by shifting both stages, one loaded with a semiconductor wafer and the other loaded with a mask, which move to the same direction and by driving them with different pitches by the distance of the difference of the pitches or number of the differences. CONSTITUTION:A gear 5 and a gear 6 transmit the rotation of a pulse motor 4 to both a mask stage 2 and a wafer stage 8 and drive these to the same direction. In this case, the positions of both the stages are shifted by the differ ence l2-l1 between the feed l1 of the mask stage 2 and the feed l2 of the wafer stage 8 per one pulse. The minute adjustment of positioning is done by sending a signal of n-pulses to the pluse motor 4 from a drive control equip ment 9 and moving both the stages 2, 8 to the same direction by nl1, nl2 respec tively. The relative shift of both the positions is nl2-nl1=n(l2-l1)=nDELTAl. If l2=1mum and l1=0.9mum, a wafer 7 is moved by 0.1mum against a mask 1. The rough adjustment of mutual positions is done by releasing the engagement of both the gears 5, 6. |
