| 摘要 |
PURPOSE:To remove dust from a small material to be washed by using a washing apparatus similar to a washing apparatus for wafers, by mounting the many small materials to be washed on a disk, in which projections and the like are provided at specified positions, and continuously washing the materials by wet and dry washing method. CONSTITUTION:A conveying tray 12 for a washing apparatus has evacuating holes 12, liquid discharging holes 12b and positioning pinds 12c in the flat surface of a stainless steel disk. Materials t be washed 9 are mounted on the flat surface of said tray 12 in two lines in a radial state at an equal interval. The materials 9 on the tray 12 are immersed in water in a wet type ultrasonic wave washing tank 3b from said conveyor 2b by a pallet 3a. When washing in the washing tank 3b is finished, the pallet 3a is lifted. The tray 12, on which the materials to be washed are mounted, is mounted on a showering conveyor 4a so as to convey the tray to a showering device 4. The tray 12 having the materials is sent to a scrubber by the showering conveyer 4a and a slider 4c. The materials to be washed 9 on the tray 12 are transferred by a conveyer 17 and sent to a front chamber 6a of an electromagnetic wave projection type washing device 6. |
