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发明名称
PHOTORESIST COMPOSITIONS WITH ENHANCED SENSITIVITY USING POLYAMIDE ESTERS
摘要
申请公布号
EP0188205(A3)
申请公布日期
1986.09.10
申请号
EP19860100099
申请日期
1986.01.07
申请人
MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
发明人
MERREM, HANS-JOACHIM, DR.;KLUG, RUDOLF, DR.;HEROLD, THOMAS, DR.
分类号
C08L7/00;C08F2/50;C08G73/00;C08G73/10;C08L21/00;C08L67/00;C08L77/00;G03C1/00;G03F7/004;G03F7/008;G03F7/027;G03F7/028;G03F7/037;G03F7/038;G03F7/105;H01L21/027;H05K3/06;(IPC1-7):G03C1/68;G03F7/10
主分类号
C08L7/00
代理机构
代理人
主权项
地址
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