| 摘要 |
PURPOSE:To improve reactivity and to change, optionally and easily, the compsn. of a film in reactive vapor deposition for which hollow cathode discharge is used, by impressing a bias voltage to a reactive gas introducing port to drawn electrons into a nozzle and activating the reactive gas. CONSTITUTION:The hollow hot cathode discharge is induced by the effect of an electric power source 7 between a water-cooled copper hearth 2 and an electron gun 4. On the other hand, DC positive or AC several tens-several hundreds V voltage is impressed between the gun 4 and a reactive gas introducing nozzle 3 by an electric power source 9. Part of the electrons in the holow cathode discharge space are thereby drawn into the nozzle 3, by which the collision is induced between the electrons and reactive gas molecules and the high-density discharge state is created. As a result, the reactive gas is partly ionized and are activated to the neutral excitation state so that the reaction on a substrate 5 is accelerated. The compd. film contg. the carbon and nitrogen at the stoichiometric compsn. ratios is thus easily formed by controlling optionally the carbon and nitrogen contents with the carbide and nitride films of not only a high-melting point transition metal but also the element requiring large activation energy.
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