| 摘要 |
PURPOSE:To realize micro-miniature processing in the order of 0.25mum or less without giving any damage on elements by using electron beam and selecting an acceleration voltage so that a secondary electron emission efficiency of sample becomes 1. CONSTITUTION:An exhaustion system comprises an oil diffusion pump 6 and an oil rotary pump 7, a gas supply system is composed of three sub-systems comprising the CF4 line 8, H2 line 9 and N2 purge line 10 and an X-Y stage 5 is provided with a pipe 11 for water cooling through circulation of cooled water in view of attracting the gas to the sample surface. An electron beam lens mount 12 is a modified SEM, which emits electron beam through thermal emission of tungsten filament 13. The electron optical system is composed of three stages and a lens of the final stage decelerates the electron beam and defocuses. A sample is put into this apparatus, the interior is exhausted by a vacuum pump, the CF4 is then supplied and a pressure is controlled by a main valve 13. Next, SiO2 is emitted with electron beam in acceleration voltage so that the secondary electron emission efficiency becomes almost 1. |
