| 摘要 |
An electron beam vaporizer with an electron beam generator (1), a first magnetic deflector system (7) with parallel elongate pole plates (8) for linear beam deflection along a first coordinate, and with a second magnetic deflector system (10) for beam deflection along a second coordinate, perpendicular to the first coordinate. An elongate vaporizing crucible (6) holds the material to be vaporized. To solve the problem of maintaining focus even over large deflection angles and to be able to correct the deflection pattern, the invention proposes the following: (a) the second magnetic deflection system (10) has two parallel, non-metallic coil cores (11) which extend parallel to the pole plates (8) of the first deflection system (7) and are disposed below them. (b) on each coil core (11) is arranged a first coil (27) having a uniform number of turns per unit length of the coil core (a linear coil) and (c) on each coil core (11) is arranged a second coil (28) which has an increased number of turns per unit length towards the two ends of the coil core (11). In a particularly advantageous manner, each of the two second coils (28) comprises a conical coil.
|
