| 摘要 |
PURPOSE:To heat a semiconductor substrate with excellent uniformity by a method wherein heat is generated in the conductive semiconductor substrate itself by eddy current induced by an induction coil. CONSTITUTION:When high frequency current is applied to an induction coil 21, eddy current is induced in a conductive semiconductor substrate 23 and the semiconductor substrate 23 is heated. Because the semiconductor substrate 23 is heated directly, the semiconductor crystal substrate can be heated uniformly. |
