| 摘要 |
PURPOSE:To elevate the measuring accuracy, by determining the gap dimensions and the deviation of the gap position from the optical axis from the distribution of quantity of light obtained in the outgoing path or the incoming path of a photoelectric conversion unit after a view adjustment at the present measuring point based on the deviation of the gap position from the optical axis at the previous measurement point. CONSTITUTION:At the first measuring point P1 of an object 2 to be measured, the deviation alpha1 of the position of a gap 1 from an optical axis are determined from the distribution of quantity of light obtained in the outgoing path of a photoelectric conversion unit (hereafter call unit) comprising a photoelectric conversion element 16 and the dimensions of the gap 1 done from that obtained in the incoming path of the unit following a view adjustment. At the second measuring point P2, the dimensions of the gap 1 and the deviation alpha2 of the gap position from the optical axis are determined from the distribution of quantity of light obtained in the outgoing path of the unit and at the third measuring point P3, the dimensions of the gap 1 and the deviation alpha3 of the gap position from the optical axis is done from the distribution of quantity of light obtained in the incoming path of the unit based on the deviation alpha2. Thereafter, likewise, the gap dimensions and the deviation are determined sequentially from distributions of quantity of light obtained in the outgoing path or the incoming path of the unit based on the deviation at the preceding measuring point. |
