发明名称 APPARATUS FOR WAFER ALIGNMENT
摘要 PURPOSE:To eliminate position discrepancy caused by delivery of a wafer by a method wherein a wafer put and fixed on an X-Y table which is enabled in reciprocal movement precisely and moved from the prealignment position to the precision alignment position with the X-Y table. CONSTITUTION:An upper stage 7b of an X-Y table 7 is enabled fine movement against a lower stage 7a precisely to the axial directions of X-X' and Y-Y'. A guide means and a driving means are provided to give the lower stage 7a reciprocal movement by a certain distance horizontally as shown by a double- directional arrow B-B'. Three-point rollers 2a-2c and a positioning roller 3 are provided on the X-Y table 7 for prealignment of the wafer 1. With this constitution, as it is not necessary for the wafer 1 to be attracted and held, surface contamination of the wafer 1 is avoided and, as such processes as attracting and holding transport delivery are not included, position discrepancy caused by transport and delivery is eliminated.
申请公布号 JPS61201440(A) 申请公布日期 1986.09.06
申请号 JP19850041079 申请日期 1985.03.04
申请人 HITACHI ELECTRONICS ENG CO LTD 发明人 NAMIKI YOSHIJI
分类号 G03F7/20;H01L21/027;H01L21/67;H01L21/68 主分类号 G03F7/20
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