| 摘要 |
PURPOSE:To enable satisfactory and constant etching by a continuous etching method when a transparent and electrically conductive film of indium oxide is etched, by controlling the concn. of hydrochloric acid in an acid soln. as an etching soln. CONSTITUTION:A transparent and electrically conductive film 1 is formed on the whole surface of each substrate 2 of glass or the like, and an etching resistant film 3 of a desired shape is formed on the film 1. In order to pattern the film 1 by the dissolution and removal of the part of the film 1 not covered with the film 3, the substrate 2 is passed through a pretreating vessel 4 and sent to an etching vessel 5, where an etching soln. is sprayed from spray nozzles 6. The substrate 2 is conveyed to the right with driving rollers 7, continuous etching can be carried out, and the sprayed etching soln. gathers in the lower part 8 of the vessel 5 and is used again. The etching soln. is a two-component aqueous soln. contg. ferric chloride and hydrochloric acid. The amount of the hydrochloric acid as free acid is regulated to >=18wt% of the total amount of the etching soln.
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