| 摘要 |
PURPOSE:To facilitate the increase in area of the film, improvement in productivity, and mass productivity, while contriving the improvement in film properties, film-forming speed, and reproducibility, and the uniformity in film quality, by a method wherein an active species A produced by decomposing a compound containing carbon and halogen and an active species B produced out of a germanium-containing compound are separately introduced, which are then made to chemically react by the action of discharge energy, thus forming a deposited film. CONSTITUTION:Under the coexistence of an active seed A produced by decomposing the compound containing carbon and halogen in place of producing plasma in a film-forming space for forming a deposited film and an active seed B produced out of a film-forming germanium-containing compound, discharge energy is made to react on these species. Since the chemical interaction by them is caused or promoted and amplified, the formed deposited film does not receive adverse effects such as etching or another action, e.g. abnormal discharge in film formation substantially. |
