发明名称 Process for producing micro Fresnel lens
摘要 A process for producing a micro Fresnel lens comprises the following steps: moving either a substrate coated with a resist layer for providing the micro Fresnel lens or a source of actinic radiation such as electron beam for exposing the resist layer relative to each other in a fixed direction; scanning linearly the resist coat with the actinic radiation in a direction perpendicular to the direction of the relative movement; during the scanning operation, performing exposure to the actinic radiation or interrupting or overlapping the application of the actinic radiation so as to form a latent image in an area corresponding to the grooved surface of the micro Fresnel lens within a predetermined width; repeating the above procedures in a direction perpendicular to that of the relative movement of the substrate and the source of actinic radiation; and developing the exposed resist layer to provide a micro Fresnel lens having the desired grooved surface.
申请公布号 US4609259(A) 申请公布日期 1986.09.02
申请号 US19840669792 申请日期 1984.11.09
申请人 PIONEER ELECTRONIC CORPORATION 发明人 SUEMITSU, TAKASHI;SUZUKI, SHINICHI;NIRIKI, TAKASHI
分类号 G02B3/08;G02B5/18;G02B7/28;G03B13/30;G03F7/00;(IPC1-7):G02B3/08 主分类号 G02B3/08
代理机构 代理人
主权项
地址