发明名称 |
Process for producing micro Fresnel lens |
摘要 |
A process for producing a micro Fresnel lens comprises the following steps: moving either a substrate coated with a resist layer for providing the micro Fresnel lens or a source of actinic radiation such as electron beam for exposing the resist layer relative to each other in a fixed direction; scanning linearly the resist coat with the actinic radiation in a direction perpendicular to the direction of the relative movement; during the scanning operation, performing exposure to the actinic radiation or interrupting or overlapping the application of the actinic radiation so as to form a latent image in an area corresponding to the grooved surface of the micro Fresnel lens within a predetermined width; repeating the above procedures in a direction perpendicular to that of the relative movement of the substrate and the source of actinic radiation; and developing the exposed resist layer to provide a micro Fresnel lens having the desired grooved surface.
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申请公布号 |
US4609259(A) |
申请公布日期 |
1986.09.02 |
申请号 |
US19840669792 |
申请日期 |
1984.11.09 |
申请人 |
PIONEER ELECTRONIC CORPORATION |
发明人 |
SUEMITSU, TAKASHI;SUZUKI, SHINICHI;NIRIKI, TAKASHI |
分类号 |
G02B3/08;G02B5/18;G02B7/28;G03B13/30;G03F7/00;(IPC1-7):G02B3/08 |
主分类号 |
G02B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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