发明名称 Process of heat treating copper film on ceramic body and heat treating apparatus therefor
摘要 A process for metallizing a copper film comprising the step of heat treating a copper film formed by an electroless plating process as opposing electrodes of a ceramic capacitor. The process comprises the steps of placing a ceramic body having a copper film formed on the surface thereof by an electroless plating process within a container sealing the same from the external atmosphere and maintaining constant the internal atmosphere, and heating the container maintaining the surrounding of the container in an inert atmosphere.
申请公布号 US4609409(A) 申请公布日期 1986.09.02
申请号 US19840670655 申请日期 1984.11.09
申请人 MURATA MANUFACTURING CO., LTD. 发明人 SENDA, ATSUO;KASANAMI, TOHRU;NAKAGAWA, TAKUJI
分类号 C04B41/00;C04B41/80;H01G13/00;(IPC1-7):C21D1/00 主分类号 C04B41/00
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