发明名称 |
Process of heat treating copper film on ceramic body and heat treating apparatus therefor |
摘要 |
A process for metallizing a copper film comprising the step of heat treating a copper film formed by an electroless plating process as opposing electrodes of a ceramic capacitor. The process comprises the steps of placing a ceramic body having a copper film formed on the surface thereof by an electroless plating process within a container sealing the same from the external atmosphere and maintaining constant the internal atmosphere, and heating the container maintaining the surrounding of the container in an inert atmosphere. |
申请公布号 |
US4609409(A) |
申请公布日期 |
1986.09.02 |
申请号 |
US19840670655 |
申请日期 |
1984.11.09 |
申请人 |
MURATA MANUFACTURING CO., LTD. |
发明人 |
SENDA, ATSUO;KASANAMI, TOHRU;NAKAGAWA, TAKUJI |
分类号 |
C04B41/00;C04B41/80;H01G13/00;(IPC1-7):C21D1/00 |
主分类号 |
C04B41/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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