| 摘要 |
PURPOSE:To enable to process a specimen gas as specified with excellent reproducibility while maintaining a processing chamber in clean state by a method wherein the processing chamber is fed with inert gas to be thoroughly exhausted without remaining any processed gas at all in the processing chamber. CONSTITUTION:A processing chamber 10 may be exhausted without remaining any processed gas produced from inert gas processing by means of feeding the processing chamber 10 with inert gas and thoroughly exhausting any processed gas therefrom utilizing an apparatus provided with a processing chamber 10 to process specimen as specified, an exhaust system 30 to pressure- reduce and exhaust the processing chamber 30, a processed gas feeding system 40 to feed the processing chamber 30 with processed gas as well as another gas feeding system 50 to feed the processing chamber 30 with inert gas with the length of average free stroke longer than that of processed gas in the exhaust stage within the processing chamber 10. |
