发明名称 ECCENTRICITY CONFORMING MECHANISM FOR OPTICAL DISK
摘要 PURPOSE:To simplify the process by conforming the eccentricity of a titled disk in the stage of duplication of a rugged pattern. CONSTITUTION:A jig 1 having the same inner diameter is fitted to a substrate (replica substrate 2) on which the rugged part is to be duplicated. The replica substrate having the jig of the same inner diameter is reproduced from a reproducing die 4 having unevenness of conformable eccentricity to the replica substrate. At this time, deviation between simultaneously duplicated unevenness and the center of the replica substrate becomes nearly the same amount of eccentricity of the reproducing die. A recording film 5 is formed on the reproduced face of the replica substrate, and the jig of the same inner diameter is attached to the replica substrate until just before assembling. The amount of eccentricity at this time is nearly the same as that at the time of reproduction, and all replica substrates reproduced from the reproducing die come within the specified amount of eccentricity.
申请公布号 JPS61196437(A) 申请公布日期 1986.08.30
申请号 JP19850036372 申请日期 1985.02.27
申请人 HITACHI LTD 发明人 OOTA SAKAE
分类号 G11B7/26 主分类号 G11B7/26
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