发明名称 |
LIQUID FLOW-DOWN TYPE PLATING METHOD |
摘要 |
PURPOSE:To attain the speed-up of the plating by providing a material to be treated in a plating liquid flow which is stirred by the synthesis of both the plating liquid flow in the axial direction of a liquid duct and the plating liquid flow in the direction rectangular thereto and plating it. CONSTITUTION:A liquid duct 18 is constituted of a flow path wall 3 provided to the inside of the first plating vessel 1 and a stirring flow 8 of the specified pressure is fed in the inside of the liquid duct 18 from a bottom of the liquid duct 18. Simultaneously the injection flows 9 are fed in the direction nearly rectangular to the stirring flow 8 by providing the injection holes 5 for a plating soln. in the neighborhood of the flow path wall 3. The plating liquid flow 10 synthesized by both the stirring flow 8 and the injection flows 9 is formed by such a way and a material 15 to be plated is provided in the plating liquid flow 8.
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申请公布号 |
JPS61195996(A) |
申请公布日期 |
1986.08.30 |
申请号 |
JP19850036047 |
申请日期 |
1985.02.25 |
申请人 |
HITACHI CABLE LTD |
发明人 |
KAYANE KOICHI;YOSHIDA HIROMICHI;HAGITANI SHIGEO;OKABE NORIO |
分类号 |
C25D5/08;C25D7/06;C25D17/00 |
主分类号 |
C25D5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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