发明名称 HEAT TREATMENT APPARATUS
摘要 PURPOSE:To enable positive ignition as well as to prevent contamination of the combustion gas by irradiating the supply area of an inflammable gas with light. CONSTITUTION:After evacuation of a process tube 1 in which a wafer 4 is accommodated in the state that it is aligned with a jig 5, hydrogen and oxygen are supplied into a vessel 11 in a wet oxygen supply unit 10, and when a infrared lamp 18 is caused to irradiate, infrared rays 18a are irradiated so as to be condensed by a concave mirror 19 to an ignition piece 17 made of high-purity silicon or the like. Since this allows the ignition piece 17 to be effective heated to a high temperature, hydrogen supplied from a hydrogen supply port 16 will fire. At this time, a small amount of high-purity ignition piece has only to be used as the ignition piece 17, so it is economical. Further it can be reduced to the extent that the danger of generation of an impurity can be ignored.
申请公布号 JPS61194728(A) 申请公布日期 1986.08.29
申请号 JP19850034310 申请日期 1985.02.25
申请人 HITACHI LTD 发明人 TAKAGAKI TETSUYA;AOYANAGI TAKASHI
分类号 H01L21/205;H01L21/22;H01L21/31 主分类号 H01L21/205
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