| 摘要 |
PURPOSE:To realize a large area of an amorphous or crystalline deposited film containing carbon while improving its various characteristics, speed of film formation and reproducibility and making quality the film uniform by a method wherein particular activated seeds which are activated separately beforehand in spaces different from a film forming space are brought into chemical reaction. CONSTITUTION:An activated seed produced by decomposing a compound containing carbon and halogen and an activated seed produced from raw material gas for film formation coexist. By applying discharge energy to them, chemical interaction is created or promoted and amplified. With this method, a film can be formed by low discharge energy and hence the formed deposited film 10 consisting of an intermediate layer 12 and a photosensitive layer 13 does not get harmful influence from etching, abnormal discharge or the like. Light energy is applied all over a substrate 11 by a suitable optical system to form the deposited film 10. |
