| 摘要 |
PURPOSE:To uniformly form a deposited film on a base of large area by chemi cally reacting an active seed A produced by decomposing a compound which contain a carbon and a halogen with an active seed B produced by a silicon- containing compound by discharge energy. CONSTITUTION:A base 211 is placed in a film forming chamber 201, the chamber is evacuated from an exhaust valve 212 while heating by a heater 208, an active seen A is fed from a guide tube 206, an active seed B is fed from a guide tube 217, discharge energy is applied by a discharge energy generator 218 to chemi cally react the seeds A, B to form a deposited film on the base 211. The seed A is produced by heating solid carbon in the chamber 202, and blowing a com pound which contains carbon and halogen. The seed B is produced by feeding silicon-containing compound in an activating chamber 219 to activate a micro wave plasma generator 220. |
