发明名称 ION BEAM DEVICE
摘要 PURPOSE:To prevent any impurities for the irradiated area of the sample from being irradiated upon said area by using the same material as that of which the irradiated area is made to form at least the surfaces of parts against which there is a possibility for ions to strike. CONSTITUTION:At least the surfaces of a hollow cathode 1, a lead-out electrode 2, a control electrode 3 and a first and a second aperture 4 and 5 having a possibility of becoming in contact with ions are made of the same material as that of which the area of a sample 6 upon which an ion beam 8 is irradiated is made. Therefore, it is possible to prevent the ion beam 8 from being contaminated by impurities for the irradiated area, thereby preventing any impurities from being irradiated upon this area.
申请公布号 JPS61195552(A) 申请公布日期 1986.08.29
申请号 JP19850034313 申请日期 1985.02.25
申请人 HITACHI LTD 发明人 MAMADA MICHIRO;KISHINO MASATAKE;DOI HIROSHI
分类号 H01J37/317;G01R31/302;H01J37/20;H01L21/265;H01L21/66 主分类号 H01J37/317
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