FORMATION OF DEPOSITED FILM

摘要

PURPOSE:To attain enlargement, improvement of productivity and mass production of the title films by a method wherein an active compound containing silicon and halogen as well as another compound produced from a chemical filming material are separately fed to a filming space to be supplied with discharging energy. CONSTITUTION:Under the coexistance of an active compound A produced by decomposing a silicon and halogen contained compound as well as another active compound B from a chemical filming material, said active compounds are chemical-reacted by means of discharging energy to form the title deposited films. A gaseous or easily gasified compound such as e.g. SiF4 etc. may be recommended for the silicon and halogen contained compound. Finally the preferable weight ratio of active compounds A and B may be 8:2-4:6.