发明名称 FORMATION OF DEPOSITED FILM
摘要 PURPOSE:To attain enlargement, improvement of productivity and mass production of the title films by a method wherein an active compound containing carbon and halogen as well as another active compound produced from a nitrogen contained filming compound are separately fed to a filming space to form said films by means of making them chemically react to each other. CONSTITUTION:An active compound A produced by decomposing carbon and halogen contained compound as well as another active compound B produced from a nitrogen contained filming compound chemically reacting to the former are separately fed to a filming space to form said films on a substrate by means of making them chemically react to each other. The life of applicable active compound A is recommended to exceed 10 seconds in terms of productivity and easy handling. A gaseous or easily gasified compound such as e.g. CF4 may be recommended for the carbon and halogen contained compound while a compound comprising nitrogen and one or exceeding two kinds of component atoms other than nitrogen may be recommended for the nitrogen contained compound. Finally the preferable weight ratio of active compounds A and B may be 8:2-4:6.
申请公布号 JPS61193427(A) 申请公布日期 1986.08.27
申请号 JP19850031583 申请日期 1985.02.21
申请人 CANON INC 发明人 ISHIHARA SHUNICHI;ONO SHIGERU;KANAI MASAHIRO;ODA TOSHIMICHI;SHIMIZU ISAMU
分类号 C23C16/30;C23C16/22;C23C16/452;G03G5/08;H01L21/205;H01L31/04 主分类号 C23C16/30
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