| 摘要 |
A method of forming a thin amorphous film on a substrate by the decomposition of a compound gas, wherein the compound gas is passed through a plurality of glow discharge generating means (21 - 24) connected in a loop, and gas supply and discharge locations are periodically altered along one direction of the loop. A thin amorphous film-forming apparatus comprising a plurality of discharge unit chambers (11 - 14) connected in a loop, each provided with a glow discharge generating means (21 - 24) and a space for storing a substrate (31 - 34), gas supply and discharge valves (61 - 64, 81 - 84) are provided between the unit chambers (11 - 14), and means for periodically changing the opening and closing of the valves (61 - 64, 81 - 84). |
