| 摘要 |
PURPOSE:To uniform a distribution of the integral quantity of light and correct it into an optional distribution of the integral quantity of light by providing a shutter for light quantity adjustment which adjusts the distribution of the integral quantity of light on an exposed surface between the exposed surface and a light source for exposure. CONSTITUTION:Ultraviolet ray from a mercury vapor lamp 7 is passed through a lens 8, a shutter 12, a mirror 9, and a lens 10 to obtain parallel ultraviolet light 11. Then, the exposed surface 13 of a photomask 4 on a substrate 6 is irradiated through a shutter plate 21. The shutter plate 21 is composed of shutter blades 22 which are opened and closed individually and optionally and controlled by a controller which is not shown in a figure. Consequently, the distribution of the integral quantity of light on the exposed surface is uniformed and corrected into an optional distribution of the integral quantity of light. |
