| 摘要 |
<p>PURPOSE:To improve the reliability of elements by eliminating problems such as the oxidation resistance and corrosion resistance of metal in the process of calcination, by a method wherein the whole is made to undergo the process of calcination after the electrode part and the wiring part other than the part of light receiving element formation are coated with a dielectric film. CONSTITUTION:A CdS, CdSe series photoconductive material previously heat- treated for activation is mixed with 6mol% of e.g. CdCl2 as a halide containing Cd as the flux and 10wt% of low melting point glass frit having a glass transition temperature of 380 deg.C, and a suitable amount of ethylcellose solution is added and dispersed even in a bowl mill, resulting in the preparation of a coating paste. On the other hand, an NiCr alloy is evaporated on a glass substrate 1 and formed into the electrode and wiring parts 2 by using a normal photolithography technique. A protection film 5 is formed by coating the NiCr metal other than the light receiving element formation part 4 with SiO2 by vacuum evaporation, thus preparing a substrate 1 for photoconductor paste coating. After said part 4 of this substrate 1 is coated with that paste by using screen printing, the paste is heat-treated for a required time at a required temperature in an N2 gas atmosphere into a photoconductive film 3.</p> |
