发明名称 PROJECTED EXPOSURE APPARATUS
摘要 PURPOSE:To realize total burning of wafer while it is placed on a carriage even in the step and scanning burning system and also improve throughput and accuracy by placing X, Y, theta stage on the carriage and placing wafer thereon. CONSTITUTION:For positioning of a photo mask 1 and a wafer 2, a X, Y, thetastage 3 is moved for matching between the alignment pattern 10 in the mask side and the alignment pattern 11 in the wafer side. When the carriage 5 is moved in the scanning direction 14, the upper left quarter part 12 of wafer, for example, is printed. The mask is changed and the stage 3 is further moved to match the alignment pattern 10' of mask 1' and the alignment pattern 11' of wafer 2 and the carriage 5 is then moved in the reverse direction in this time. Thereby, for example, the lower left quarter part 12' is printed. In the same way, the upper right quarter part 12'' and lower right quarter part 12''' are printed, completing the entire part of wafer.
申请公布号 JPS61188933(A) 申请公布日期 1986.08.22
申请号 JP19850028357 申请日期 1985.02.18
申请人 CANON INC 发明人 SHINKAI HIROSHI;ISOHATA JUNJI
分类号 G03F7/20;G03F9/00;H01L21/027;H01L21/30 主分类号 G03F7/20
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