| 摘要 |
PURPOSE:To obtain a developing device which does not cause the variance, etc., of the pattern dimensions during the manufacture, etc., of a semiconductor and a liquid crystal displaying device by changing the developing time in accordance with the change with the lapse of time of the developing device used circulated in the automatic developing device used for the photo etching. CONSTITUTION:In the automatic developing device used for the photo etching which needs the fine processing such as the manufacture and the special process of a semicon ductor device and a liquid crystal displaying device, a latent image in the photo resist, to which the pattern is burnt, mounts a substrate 2 formed at the surface onto a transporting belt 1, and a developing liquid 5 sent from a developing liquid thermostatic oven by a pump 8 is sprayed from a spraying nozzle 6 and developed. The developing liquid 5, which complets to develop, is returned to the oven 7, and circulated and used again. At such a time, a belt 1 is driven through a communicating mechanism 4 by a driving motor 3. The change with the passage of time is executed for the developing liquid 5, and even then, the rotation of the motor is controlled to keep constant the pattern dimensions, the shifting speed of the belt 1 is changed in accor dance with the capacity of the developing liquid 5, and the constant pattern dimensions are formed. |
