发明名称 ION IMPLANTING APPARATUS
摘要 PURPOSE:To utilize different kind of ion beams simultaneously and effectively by employing plural chambers at mass spectrograph electromagnet section while providing passages for different kind of ion beams. CONSTITUTION:Ions produced from an ion source 1 are taken out as an ion beam through a take-out electrode 2 then required kind of ions are selected through a chamber 7a at mass spectrograph electromagnet section 3 than passed through a beam line 4a and converged through a slit 5a to be impinged against the entire face of target filled at the end station 6a. While unnecessary ion beam 9 will pass through a chamber 7b at the magnet section 3 then through a beam line 4b and reach to the end station 6b to be utilized effectively. Consequently, different kind of ion beams can be utilized effectively while the sidewall of chamber 7 can be protected from damage due to impingement of beam 9.
申请公布号 JPS61188844(A) 申请公布日期 1986.08.22
申请号 JP19850029075 申请日期 1985.02.15
申请人 MITSUBISHI ELECTRIC CORP 发明人 MATSUDA SHINTARO
分类号 H01J37/05;H01J37/317;H01L21/265 主分类号 H01J37/05
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