发明名称 PATTERN GENERATOR
摘要 A pattern generator in which a workpiece to be machined into a desired pattern shape is held in vacuum and is irradiated with a laser beam condensed to be fine, while scanning the laser beam so as to depict the desired pattern shape, whereby the workpiece is directly machined in conformity with the desired pattern shape. As the workpiece, one in which a shading film (for example, chromium film) is deposited on a transparent glass substrate is employed, and it is irradiated with the laser beam in the vacuum, whereby the irradiated parts of the shading film are vaporized to fabricate a shading mask pattern of good quality.
申请公布号 EP0054315(B1) 申请公布日期 1986.08.20
申请号 EP19810110558 申请日期 1981.12.17
申请人 HITACHI, LTD. 发明人 HOSAKA, SUMIO;TAKANASHI, AKIHIRO;KUROSAKI, TOSHIEI;KUNIYOSHI, SHINJI;KAWAMURA, YOSHIO;TERASAWA, TSUNEO
分类号 B23K26/08;B23K26/12;B41M5/24;G03F7/20;H01L21/027;H01L21/30 主分类号 B23K26/08
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