METHODS OF PROCESSING A SILICON SUBSTRATE FOR THE FORMATION OF AN INTEGRATED CIRCUIT THEREIN,申请号EP19820101676-传众专利搜索

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发明名称	METHODS OF PROCESSING A SILICON SUBSTRATE FOR THE FORMATION OF AN INTEGRATED CIRCUIT THEREIN
摘要
申请公布号	EP0066042(A3)	申请公布日期	1986.08.20
申请号	EP19820101676	申请日期	1982.03.04
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	LEVER, REGINALD FRANK;RAACKE, KARL HEINZ
分类号	C23F4/00;C23C14/08;H01L21/302;H01L21/3065;H01L21/308;H01L21/316;(IPC1-7):H01L21/76;H01L21/306	主分类号	C23F4/00
代理机构		代理人
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