摘要 |
NEW MATERIAL:A compound of formula I (R<1> is 2-10C alkyl; R<2>-R<6> are H, halogen, alkyl, alkoxy, alkoxycarbonyl). EXAMPLE:The compound of formula II. USE:Recording and memorizing material, copying material, photosensitive material for printing, photosensitive material for laser, photosensitive material for photocomposition, optical filter, masking material, photometer, material for displaying. PREPARATION:For example, the reaction of a compound of formula III with a nitroso-2-naphthol derivative of formula IV is carried out usually in a solvent such as ethanol, preferably at 40-120 deg.C.
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