发明名称 |
High intensity microfocus X-ray source for industrial computerized tomography and digital fluoroscopy |
摘要 |
A high intensity microfocus x-ray source for the inspection of superalloy objects and the like operates at a voltage of the order of 400-500 kV with an electron beam focal spot size of the order of 2-10 mils and at power levels of tens to hundreds of kilowatts and affords a brightness improvement of at least three thousand over conventional x-ray sources.
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申请公布号 |
US4607380(A) |
申请公布日期 |
1986.08.19 |
申请号 |
US19840623903 |
申请日期 |
1984.06.25 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
OLIVER, DAVID W. |
分类号 |
H01J35/10;H01J35/14;(IPC1-7):H01J35/14;H01J35/26 |
主分类号 |
H01J35/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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