| 摘要 |
PURPOSE:To prevent blackening or melting away of aluminum deposition film by forming thin layer composed of silicon dioxide film or fine grain onto graphite or carbon black film constituting black matrix. CONSTITUTION:Photoresist 2 is applied onto a glass panel 1 then the positions (g), (b), (r) to be formed with picture elements are exposed and developed to remove the non-exposed portion 3. Then a graphite film 4 is formed and solution composed of ethyl silicate, ethanol and water is applied to hydrolyze ethyl silicate to form silicon dioxide film 7. Thereafter, photoresist 2 is removed together with the graphite 4 and the silicon dioxide film 7 to complete a black matrix 11. Furthermore, green, blue and red picture elements G, B, R are formed and smoothed with organic film 5 then aluminum deposition film 6 is formed and baked to decompose all organic substance including the organic film 5. |
