| 摘要 |
PURPOSE:To plate uniformly a large plating sample as well by constituting a device which generates stationary plasma for ion plating in an axisymmetrical magnetic field having high confining power to decrease the loss of the plasma ions to a vessel wall. CONSTITUTION:A strong barmagnet 1 is disposed under a hearth 7 in common use as an anode and a relatively weak auxiliary magnet 3 is disposed behind a plasma source 2 in such a manner that the same polarities face each other to form the magnetic field configuration for confining the plasma into the spherical shell shape. The plasma is thereupon injected downward from a plasma source 2, then part of the plasma arrives at a cylindrical cathode 5 along magnetic lines 4 of force and the rest crosses the central point 6 of the magnetic field and arrives at the hearth 7 in common use as the anode and the cathode 5, by which the plasma is confined into the spherical shell shape 8. The plasma ions are thus absorbed and the sample is plated when a voltage is impressed to an ion collector 11.
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