发明名称 INSPECTION DEVICE FOR RESIDUE OF ORGANIC COMPOUND OF RESIST OR THE LIKE
摘要 <p>PURPOSE:To attempt automation and labor saving in inspection by irradiating ultraviolet rays on a substrate after removal of a resist, detecting fluorescence emitted from a residue of an organic compound on the substrate and discriminating the residue of the organic compound on the substrate. CONSTITUTION:Ultraviolet rays 3 exclusive of visible rays are irradiated on a substrate 4 to be inspected from a light source 1 through a filter 2. When a residue 5 of an organic compound of a resist and the like is made to adhere to the substrate 4, the residue 5 absorbs the ultraviolet rays 3 and emits fluorescence of visible rays. This fluorescence 6 is received by a light receiver 7 provided over the substrate 4. The light receiver 7 converts the received fluorescence into an electrical signal, which is sent to a signal processing unit 8. The processing unit 8 processes the signal sent from the light receiver 7 and discriminates the presence or absence of the residue of the organic compound of the resist and the like. This allows automation and labor saving in inspection as well as presence or absence of the residue of the organic compound to be discriminated correctly and quickly.</p>
申请公布号 JPS61182238(A) 申请公布日期 1986.08.14
申请号 JP19850023170 申请日期 1985.02.07
申请人 SHARP CORP 发明人 NISHIMURA YASUNORI
分类号 G01N21/64;G01N21/88;G01N21/956;G03F1/84;H01L21/027;H01L21/66 主分类号 G01N21/64
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