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发明名称
POSITIVE PHOTORESISTMISCHUNG
摘要
申请公布号
DE3603372(A1)
申请公布日期
1986.08.14
申请号
DE19863603372
申请日期
1986.02.05
申请人
MITSUBISHI CHEMICAL INDUSTRIES LTD.
发明人
MIURA,KONOE;OCHIAI,TAMEICHI;KAMEYAMA,YASUHIRO
分类号
G03C1/72;G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/08;G03C1/495
主分类号
G03C1/72
代理机构
代理人
主权项
地址
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