| 摘要 |
PURPOSE:To prevent atmospheric air from invading by conveying wafers into a reaction tube so that gas atmosphere used for inert gas or treating gas is provided around and between the wafers. CONSTITUTION:A door 13 is closed, and N2 gas is flowed from a pipe 12 toward the interior B of a furnace in the state that a reaction tube 4 is closed. When the door 13 is opened, and the gas is flowed from the interior B through a pipe 16 to a furnace port A. Further, the N2 gas is injected from a hole 6 toward the surroundings of and between the wafers. A fork 3 which places a jig 2 for holding a wafer 1 is moved to convey the jig 2 to the prescribed position. The jig 2 is placed on the inner wall of the tube 4, and the fork 3 is moved backward out of the furnace. The gas from the hole 6 is stopped, and the door 13 is stopped. At this time, the gas from the pipes 12, 16 is stopped, a valve is opened to evacuated in vacuum by a vacuum pump 14. Thus, the effect of the atmospheric air is removed to stably treat the surface of the wafer. |
