| 摘要 |
PURPOSE:To eliminate the speckle noise and to form a clear-cut and fine pattern by a method wherein an excimer laser is used as the illuminating light source to be used for reproducing the hologram. CONSTITUTION:The desired pattern is transferred onto the photosensitive film using a holography. At that time, an excimer laser is used as the illuminating light source to be used for reproducing the hologram. Light rays 8 from the excimer laser are irradiated on a hologram 6 and an Si wafer 9 applied with a resist is put on the focal surface, where the real image is formed. By this way, the reduced pattern of the former pattern on the mask can be favorably obtained. |
