发明名称 REACTION TUBE FOR VAPOR GROWTH APPARATUS
摘要 PURPOSE:To form a reaction tube enabling the excellent growth of crystals, by providing a plurality of folds of partition walls at intervals concentrically with the central axis of the reaction tube so that the ends of the partition walls are located farther on the downstresm side of a flow of a gaseous body as walls are positioned farther outside of the central axis. CONSTITUTION:A material which would otherwise stick to an inserted tube 20b is forwarded downstream by a gaseous body flowing between inserted tubes 20a and 20b. Although the material is diffused and is to stick to an inserted tube 20c, it is forwarded downstream further, not sticking to the inserted tube 20c, by the gaseous body flowing between the inserted tubes 20b and 20c. By the repetition of these actions, eventually, the material diffused toward the walls of the tubes are forwarded on the downstream side of a sub strate 4 for growth. As the result, no sticking of a reaction product occurs on the inner wall in the vicinity and on the upstream side of the position of the substrate 4 for growth inside the reaction tube 1.
申请公布号 JPS61181122(A) 申请公布日期 1986.08.13
申请号 JP19850021143 申请日期 1985.02.06
申请人 NEC CORP 发明人 KOBAYASHI KENICHI
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
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