TREATING DEVICE FOR RESIST

摘要

PURPOSE:To uniformize the temperature of a substrate and to stabilize the sensitivity of the resist by a method wherein the baking chamber and the cooling chamber are partitioned by the shutter and the cooling mechanism to receive the substrate is provided at a position lower than the heating plate in the baking chamber. CONSTITUTION:The substrate is conveyed by a walking beam 1 consisting of a pair of beam-form rails. The baking chamber and the cooling chamber are provided midway of the walking beam 1. The baking chamber and the cooling chamber are portioned by a heat insulating plate 2 and a shutter 3. Heating units 5 and a heating plate 6 are respectively provided on the upper side and the lower side in the baking chamber. On the other hand, a cooling mechanism 7 to receive the substrate is provided at a position lower than the heating plate 6 on the lower side of the beam 1 in the walking chamber. The substrate in after being baked is brought into close contact to a temperature control plate 8 by heat insulating pins and is cooled.