发明名称 |
Monolithic bipolar MOS switching device. |
摘要 |
<p>A semiconductor device in which, in a planar type bipolar transistor having a collector layer (22) in a substrate side, a base layer (23) formed on the collector layer (22) and an emitter island (24) formed in the base layer (23), a groove (25) is provided in the emitter island (24) to mach at least the interface between the base layer (23) and the collector layer (22) to form a conductive film (27) through a dielectric film (26) in the groove as to be employed as a gate electrode of a MOS-FET thereby to implement a monolthic parallel Bi-MOS device, while the base electrode (28) of the bipolar transistor (40) and the gate electrode (29) of the MOS-FET (50) are connected with a help of diodes including a zener diode (10) thereby to implement a monolithic three-terminal parallel Bi-MOS switching device of small chip size.</p> |
申请公布号 |
EP0190931(A2) |
申请公布日期 |
1986.08.13 |
申请号 |
EP19860300786 |
申请日期 |
1986.02.05 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MAJUMDAR, GOURAB C/O MITSUBISHI DENKI K. K. |
分类号 |
H01L29/78;H01L21/331;H01L21/8249;H01L27/04;H01L27/06;H01L27/07;H01L29/73;H01L29/739;H03K17/04;H03K17/567;(IPC1-7):H01L27/06 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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