| 摘要 |
PURPOSE:To reduce a half-shade part, and to contrive to enhance resolution of a mask for X-ray exposure by a method wherein an X-ray absorbing pattern is made to have an inclined surface in relation to a mask base plate, and the section thereof in the beam width direction is made to a trapezoid or made to have a shape close to a trapezoid. CONSTITUTION:A mask for X-ray exposure is constructed of a mask base plate 9 and an X-ray absorbing pattern 8, the pattern 8 has the inclined side in relation to the base plate 9, and the section in the line width direction is a trapezoid or has a shape close to a trapezoid. The broken lines in the figure indicate an X-ray absorbing pattern 5 having the vertical side wall in relation to the base plate 9. A half-shade part generated according to the pattern 5 thereof is the part formed by incident X-rays B, C, and size thereof is delta1. While, a half-shade part generated according to the pattern 8 is the part formed by the incident X- rays A, C, and size thereof is delta2. Size delta2 of the half-shade part formed by the pattern 8 is smaller distinctly as compared with size delta1 of the half-shade part formed by the pattern 5 like this. |
