| 摘要 |
PURPOSE:To enable inspection of a photomask independent on a setting position of the photomask, by performing inspection in accordance with an angle of the photomask and co-orainate conversion from a position of X-Y plotter output time. CONSTITUTION:A photomask 1 is displaced at the specified unit by an automatic feed mechanism 7 of a photomask inspecting system performing inspection of the photomask consisting of a rectangle with crest points A, B, C and D an image information from the mask 1 is inspected horizontally with a segment AB and read out by means of a line scanning type solid body image developing element 3 through an optical system 2. Thus read out information is converted to binary data of 1 bit/image by a binarizing circuit 4 to be stored in a memory 5. From the binary data stored in this memory 5, existence/non-existence of defective pattern is detected by a defect detecting circuit 6. When a defective pattern is detected by this circuit 6. |
