发明名称 PLASMA APPLYING DEVICE
摘要 PURPOSE:To obtain a plasma applying device which produces efficiently plasma by providing a magnet along the outside flank of a plasma generating vessel provided with plural permanent magnets combined alternately with polarities and applying an approximately uniform magnetic field to the vessel. CONSTITUTION:The permanent magnets 2 are disposed on the outside circumference of the plasma generating vessel 1 in such a manner that the N poles and S poles contact alternately with the outside circumference of the circumferential surface. A DC voltage is impressed between a cathode 3 and the vessel 1 as the anode and gaseous Ar 5 or the like is introduced through a gas introducing port 4 into the vessel and is electrolytically dissociated by the arc discharge of the low voltage. A cylindrical coil 6 provided along the outside flank of the vessel 1 acts as an electromagnet to apply the approximately uniform magnetic field in one direction to the vessel 1 over the entire part thereof thereby increasing the plasma density. An ion beam is taken out of the generated plasma by a beam leading out electrode system consisting of a plasma electrode 7, an accelerating electrode 8 and a decelerating electrode 9.
申请公布号 JPS61177382(A) 申请公布日期 1986.08.09
申请号 JP19850016578 申请日期 1985.02.01
申请人 HITACHI LTD 发明人 KUROSAWA TOMOE;SATO TADASHI;ONO YASUNORI;OSHITA YOICHI
分类号 H01L21/302;C23F1/08;C23F4/00 主分类号 H01L21/302
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